欧美 日韩 中国 成人,95免费视频在线观看,亚洲欧美中文字幕第一页,东北老女人的大黑穴视频

咨詢熱線

13651969369

當(dāng)前位置:首頁(yè)   >  產(chǎn)品中心  >  二維材料  >  二維材料薄膜  >  基于二氧化硅襯底的三角形單層二硫化鉬

基于二氧化硅襯底的三角形單層二硫化鉬

簡(jiǎn)要描述:Isolated monolayer thickness MoS2 are grown onto SiO2/Si substrates. This particular product contains monolayer thickness MoS2 triangular flakes randomly distributed across SiO2/Si substrate.

  • 更新時(shí)間:2024-06-03
  • 產(chǎn)品型號(hào):
  • 廠商性質(zhì):生產(chǎn)廠家
  • 訪  問(wèn)  量:933

詳細(xì)介紹

Isolated monolayer thickness MoS2 are grown onto SiO2/Si substrates. This particular product contains monolayer thickness MoS2 triangular flakes randomly distributed across SiO2/Si substrate. While some regions reach continuity with coalesced MoS2 triangles, this sample contains well-separated triangles for advanced spectroscopy, microscopy, and electronic measurements. Synthesized monolayer MoS2 triangles are highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness. Overall, MoS2 monolayer thickness triangles are more luminescent compared to MoS2 triangles grown onto sapphire substrates.



Sample Properties.

Sample size

1cm x 1cm square shaped

Substrate type

Thermal oxide (SiO2/Si) substrates

Coverage

Isolated and Partially Merged Monolayer Triangles

Electrical properties

       1.85 eV Direct Bandgap Semiconductor

Crystal structure

Hexagonal Phase

Unit cell parameters

a = b = 0.313 nm, c = 1.230 nm, α = β = 90°, γ = 120°

Production method

Atmospheric Pressure Chemical Vapor Deposition (APCVD)

Characterization methods

Raman, photoluminescence, TEM, EDS

Specifications

1)    Identification. Well-separated MoS2 domains across SiO2/Si chip.

2)    Physical dimensions. One centimeter in size. Larger sizes up to 2-inch wafer-scale available upon requests.

3)    Smoothness. Atomically smooth surface with roughness < 0.1-0.2 nm.

4)    Uniformity. Highly uniform surface morphology. MoS2 triangles are scattered across sample

5)    Purity. 99.9995% purity as determined by nano-SIMS measurements

6)    Reliability. Repeatable Raman and photoluminescence response

7)    Crystallinity. High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline monolayer flakes.

8)    Substrate. SiO2/Si chips but our research and development team can transfer MoS2 triangles onto variety of substrates including PET and quartz without significant compromising of material quality.

9)    Defect profile. MoS2 monolayer triangles do not contain intentional dopants or defects. However, our technical staff can produce defected MoS2 using α-bombardment technique.


Supporting datasets [for Monolayer MoS2 Triangles on SiO2/Si]


 Transmission electron images (TEM) acquired from CVD grown MoS2 isolated triangles on SiO2/Si confirming highly crystalline nature of monolayers

Energy dispersive X-ray spectroscopy (EDX) characterization on CVD grown MoS2 isolated triangles on SiO2/Si confirming Mo:S 1:2 ratios

Room temperature photoluminescence spectroscopy (PL) and Raman spectroscopy (Raman) measurements performed on CVD grown MoS2 isolated triangles on SiO2/Si Raman spectroscopy measurement confirm monolayer nature of the CVD grown samples and PL spectrum display sharp and bright PL peak located at 1.85 eV in agreement with the literature.


產(chǎn)品咨詢

留言框

  • 產(chǎn)品:

  • 您的單位:

  • 您的姓名:

  • 聯(lián)系電話:

  • 常用郵箱:

  • 省份:

  • 詳細(xì)地址:

  • 補(bǔ)充說(shuō)明:

  • 驗(yàn)證碼:

    請(qǐng)輸入計(jì)算結(jié)果(填寫(xiě)阿拉伯?dāng)?shù)字),如:三加四=7
泰州巨納新能源有限公司
  • 聯(lián)系人:陳谷一
  • 地址:江蘇省泰州市鳳凰西路168號(hào)
  • 郵箱:taizhou@sunano.com.cn
  • 電話:021-56830191
聯(lián)系我們

掃一掃以下二維碼了解更多信息

銷(xiāo)售微信咨詢

網(wǎng)站二維碼

版權(quán)所有©2025泰州巨納新能源有限公司All Rights Reserved    備案號(hào):蘇ICP備17000059號(hào)-2    sitemap.xml    總訪問(wèn)量:77663
管理登陸    技術(shù)支持:化工儀器網(wǎng)    
文水县| 五河县| 田东县| 长武县| 马龙县| 成安县| 库尔勒市| 达拉特旗| 澄迈县| 轮台县| 金溪县| 民权县| 淳化县| 临漳县| 嘉善县| 衡南县| 巩义市| 襄城县| 东阳市| 恭城| 四子王旗| 阿拉善左旗| 兴业县| 望城县| 宿迁市| 方正县| 文山县| 古蔺县| 方城县| 邢台市| 西峡县| 大石桥市| 乐昌市| 兴和县| 东明县| 华坪县| 洪泽县| 金阳县| 华阴市| 乌拉特中旗| 青岛市|